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> Boron is usually the P type dopant of choice.

I want to note that in what has become the largest (by mass) application of semiconductors, silicon PV cells, boron has been replaced by gallium as the P type dopant of choice. Boron suffers from an annoying form of light-induced efficiency degradation that gallium avoids.



Fair enough, my ion implant experience was DRAM / flash. I never worked on PV.




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